- Device
- Technical University Darmstadt
Suess Microtec LabSpin6
- Materials Science
- Structuring and Processing of Materials
- Device Type
- Spin Coater
- Device Name
- Suess Microtec LabSpin6
- Device Variants
- Spin Coater for Wafers
Device Description
Bench-mounted spin coater with vacuum chuck.
Device Application
The spin coater is used for manually applying (coating) and developing photoresist on whole wafers, wafer pieces, and both round and square substrates.
