- Device
- Technical University Darmstadt
Oxford Instruments Plasmalab 100
- Materials Science
- Additive Manufacturing – State‑of‑the‑art Production Technology and Materials Analytics
- Device Type
- Vapor Deposition System
- Device Name
- Oxford Instruments Plasmalab 100
- Device Variants
- PECVD- ICP
Device Description
PECVD with ICP and process gases Ar, CH₄, He, N₂, silane, SF₆, NO.
Device Application
Deposition of layers such as SiO, SiN and SiC at 80°C.
