- Device
- Technical University of Darmstadt
Mask Aligner Karl Süss MA 56
- Materials Science
- Structuring and Processing of Materials
- Device Type
- Exposure System
- Device Name
- Mask Aligner Karl Süss MA 56
- Device Variants
- UV Exposure System
Device Description
UV imagesetter with mercury vapor lamp and g-line and i-Line filters (365 nm), maximum exposure size is 4".
Device Application
Exposure of photoresists with masks for structuring substrates up to a size of 4".
Core Facility
ETIT Clean Room Facilities
Project Status
default
