- Device
- Technical University Darmstadt
Mask Aligner Karl Süss MJB3
- Materials Science
- Structuring and Processing of Materials
- Device Type
- Exposure System
- Device Name
- Mask Aligner Karl Süss MJB3
- Device Variants
- UV Exposure System
Device Description
UV exposure system with a mercury‑vapor lamp and i‑Line filter (365 nm); maximum exposure size 3 inches.
Device Application
Exposure of photoresist through masks for patterning substrates up to 3‑inch size.
